Aluminum Nitride Plate Ceramic Plate Aluminum Base Plate

Aluminumnitrideplate
Aluminum Nitride(AlN)
Aluminumnitride (AlN) is a nitride of aluminum.Its wurtzite phase(w-AlN) is a wide band gap(6.01-6.05 ev at room temperature) semiconductor material,giving it potential application for deep ultraviolet optoelectronics.Aluminum nitride is stable at high temperatures in inert atmospheres and melts at 2800°C.In a vacuum,AlN decomposes at 1800 °C.In the air,surface oxidation occurs above 700 °C,and even at room temperature,surface oxide layers of 5-10 nm have been detected.This oxide is stable in hydrogen and carbon dioxide atmospheres up to 980 °C.
Application:
Opto-electronics,
Dielectriclayersinopticalstoragemedia,
Electronicsubstrates,chipcarrierswherehighthermalconductivityisessential,
Militaryapplications,
As a crucible to grow crystals of gallium arsenide.
Steel and semiconductor manufacturing. PropertyUnitAluminum nitride (AlN)Densityg/cm3.2 Thermal conductivity W/m·K 170 Thermal expansion 10-6/℃ 4 Specific heat J/kg*°K 730 Coefficient of elasticity Gpa 340 Tensile strength Mpa 400 Compressive strength Mpa 2070 Flexual strength Mpa 350 Melting point ℃ 2400
Aluminumnitrideceramic can be made asAluminumnitrideparts,Aluminumnitridestructureparts,
Aluminumnitrideplate,AluminumnitrideheaterAluminumnitridesheet,Aluminumnitridedisc,Aluminumnitridepowder,SinteredAluminumnitride,Aluminumnitriderod,Aluminumnitridesubstrate,etc.
Customized aluminum nitride parts are also welcomed but please provide your drawing.